ALD grown Co3O4 as a co-catalyst in photocatalysis
Jiyeon Kim, Ruhr-University Bochum, Bochum, GermanyTomi Iivonen, University of Helsinki, Helsinki, FinlandRadim Beranek, University of Ulm, Ulm, GermanyAnjana Devi, Ruhr-University Bochum, Bochum, Germany
Cobalt oxide together with TiO2 is a promising photocatalyst due to its enhanced catalytic activity compared to the undoped TiO2. Cobalt oxide is a co-catalysts and it takes part in the charge separation and oxygen reduction reaction in the photocatalytic system. Although cobalt oxides possess highly potential applications, the available literature on nanostructured cobalt oxide is limited compared to other metal oxides. In order to achieve an enhanced catalytic activity, a defined morphology and highly controlled thickness of the deposited co-catalysts are required.
Currently we have been working on the Co3O4 thin film growth via Atomic Layer Deposition (ALD) technique, which allows access to the aforementioned requirements. Depositions have been performed on Si(100) substrate and also on the FTO (Fluorine doped Tin Oxide) substrate by ozone assisted ALD process. Deposited films were characterized to confirm the structure, chemical composition and morphology. Further analysis in terms of optical properties and preliminary catalytic tests will be presented and discussed in the presentation.
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