Recommended reading list of early publications on atomic layer deposition-Outcome of the "Virtual Project on the History of ALD"
Ahvenniemi, Esko and Akbashev, Andrew R. and Ali, Saima and Bechelany, Mikhael and Berdova, Maria and Boyadjiev, Stefan and Cameron, David C. and Chen, Rong and Chubarov, Mikhail and Cremers, Veronique and Devi, Anjana and Drozd, Viktor and Elnikova, Liliya and Gottardi, Gloria and Grigoras, Kestutis and Hausmann, Dennis M. and Hwang, Cheol Seong and Jen, Shih-Hui and Kallio, Tanja and Kanervo, Jaana and Khmelnitskiy, Ivan and Kim, Do Han and Klibanov, Lev and Koshtyal, Yury and Krause, A. Outi I. and Kuhs, Jakob and Kaerkkaenen, Irina and Kaariainen, Marja-Leena and Kaariainen, Tommi and Lamagna, Luca and Lapicki, Adam A. and Leskela, Markku and Lipsanen, Harri and Lyytinen, Jussi and Malkov, Anatoly and Malygin, Anatoly and Mennad, Abdelkader and Militzer, Christian and Molarius, Jyrki and Norek, Malgorzata and Ozgit-Akgun, Cagla and Panov, Mikhail and Pedersen, Henrik and Piallat, Fabien and Popov, Georgi and Puurunen, Riikka L. and Rampelberg, Geert and Ras, Robin H. A. and Rauwel, Erwan and Roozeboom, Fred and Sajavaara, Timo and Salami, Hossein and Savin, Hele and Schneider, Nathanaelle and Seidel, Thomas E. and Sundqvist, Jonas and Suyatin, Dmitry B. and Torndahl, Tobias and van Ommen, J. Ruud and Wiemer, Claudia and Ylivaara, Oili M. E. and Yurkevich, Oksana
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume: 35 Pages: 010801
Published: jan 2017
Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name "molecular layering" (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency. (C) 2016 Author(s).